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9,858.000 Yen (FY1998; 3,196,000 Yen)
To examine dose-effect relationship between longer wave-length UV and cellular damage, we have devised an UV-applicator with shutters controlled electrically, which enabled various irradiation conditions. With this applicator, we observed the effects of low dose UVB exposure. We noticed that detachment of cells from matrix plate, which seemed to be related to apoptosis. This detachment was dependent to dose, but not to exposure pattern. Effects of the exposure to the 30J/m 290nm UV was almost the same within the range from 0.6μ W to 25 kt W. Production of thiobarbituric acid reactive substances (TBA-RS) was elevated in the medium of cultures which had been exposed to UVB and had caused the detachment.
UV-B, Oxidative stress, TBA-RS, apoptosis, dose-dependency